1996 01
非平衡磁控溅射及其应用
基金项目(Foundation):
邮箱(Email):
DOI:
10.13922/j.cnki.cjovst.1996.01.009
中文作者单位:
北京长城钛金技术联合开发公司!北京100080,清华大学材料系!北京100084
摘要(Abstract):
磁控溅射镀膜技术由于其显著的特点已经得到广泛的应用。但是常规磁控溅射靶表面横向磁场紧紧地束缚带电粒子，使得在镀膜区域的离子密度很低，一定程度上削弱了等离子体镀膜的优势。通过有意识地增强或削弱其中一个磁极的磁通量，使得磁控溅射靶的磁场不平衡，可以大大提高镀膜区域的等离子体密度，从而改善镀膜质量。此外还讨论该项技术目前的发展状况。
关键词(KeyWords):
非平衡磁控溅射;;阴极电弧;;离子镀
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参考文献
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20 Monaghan D P,Teer D G, Laing K C et al. Surf Coat Technol, 1993 ; 59: 21 ~25
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23 Mfinz W D,Hauzer F J,SChulze D et al. Surf Coat Technol, 1991; 49: 161 ~ 167
2 Schiller S,Heisig V,Goedicke K. Thin Solid Films, 1977; 40: 327
3 Marinov M. Thin Solid Films, 1977; 46: 267
4 Martin P J, Macleod H A,Netter field R P et al. Appl Opt, 1983;22: 178
5 Bland R D, Kominiak G J,Mattox D M. J Vac Sci Tecnol, 1974; 11 (4): 671 ~ 674
6 Mtinz Wolf-ixeter. Surf Coat Technol, 1991; 48: 81 ~ 95
7 Musil J,Kadlec S. Vacuum, 1990; 40(5 ): 435~ 444
8 Hofmann D,Hensel B, Yasuoka M et of . Surf Coat Technol, 1993; 61: 326~ 330
9 Window B, Savvides N. J Vac Sci Technol, 1986 ; A4 (2): 196~ 202
10 Window B,Savvides N. J Vac Sci Technol, 1986;A4 (3): 453~ 456
11 Savvides N,Window B. J Vac Sci Technol, 1986;A4(3): 504~508
12 Spencer A G,Oka K, Howson R p et al. Vacuum, 1988; 38 (8~ 10): 857~859
13 Teer D G. Surf Coat Techno1, 1988; 36: 901
14 Musil J,Kadlec S, Vyskocil J et al. Surf Coat Technol, 1989 ; 39/40: 301
15 Sproul W D, Rudnik P J, Graham M E et al. Surf Coat Technol, 1990; 43/44: 270~278
16 Rohde S L,Hultman L,Wong M S el al. Surf Coat Technol, 1992; 50: 255~ 262
17 Graham M E. Thin Solid Films, 1990; 193/194: 117~ 126
18 Robinson P,Matthews A. Surf Coat Technol, 1990; 43/44: 288~ 298
19 Teer D G. Surf Coat Technol, 1989; 39/40: 565~ 572
20 Monaghan D P,Teer D G, Laing K C et al. Surf Coat Technol, 1993 ; 59: 21 ~25
21 Arnell R D. Surf Coat Technol, 1993; 59: 105~ 109
22 Mfinz W D, Schulze D,Hauzer F J. Surf Coat Technol, 1992; 50: 169~ 178
23 Mfinz W D,Hauzer F J,SChulze D et al. Surf Coat Technol, 1991; 49: 161 ~ 167
基本信息:
DOI：10.13922/j.cnki.cjovst.1996.01.009
中图分类号:TN305
引用信息:
[1]董骐,范毓殿.非平衡磁控溅射及其应用[J].真空科学与技术,1996(01).DOI:10.13922/j.cnki.cjovst.1996.01.009.
基金信息:
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