| 1,297 | 111 | 134 |
| 下载次数 | 被引频次 | 阅读次数 |
磁控溅射镀膜技术由于其显著的特点已经得到广泛的应用。但是常规磁控溅射靶表面横向磁场紧紧地束缚带电粒子，使得在镀膜区域的离子密度很低，一定程度上削弱了等离子体镀膜的优势。通过有意识地增强或削弱其中一个磁极的磁通量，使得磁控溅射靶的磁场不平衡，可以大大提高镀膜区域的等离子体密度，从而改善镀膜质量。此外还讨论该项技术目前的发展状况。
Abstract：Magnetron sputtering has beconle a widely used physical vapor deposition technique due to itsoutstanding features. While the parallel magnetic fleId on a standard magnetron target strongly restricts thee1ectrons and in turn ions nearby frorn escaPing towards substrates,resulting in a quite low plasma density incoating area,which makes the benefit of using the magnetron sputtering technique Iost to some extent. Bystrengthening or weakening the magnetic flux from one fo the two opposite magnetic poles in order to establish an unbalanced magnetic field,one couId greatly enhance the plasma density in the coating area and irnprove the properties of deposlted films. This paper presents the deve1opment and the prosperity of this technique.
1 Thornton J A,Penfold A S. Thin Film Processes. New York: Academic, 1978: 75
2 Schiller S,Heisig V,Goedicke K. Thin Solid Films, 1977; 40: 327
3 Marinov M. Thin Solid Films, 1977; 46: 267
4 Martin P J, Macleod H A,Netter field R P et al. Appl Opt, 1983;22: 178
5 Bland R D, Kominiak G J,Mattox D M. J Vac Sci Tecnol, 1974; 11 (4): 671 ~ 674
6 Mtinz Wolf-ixeter. Surf Coat Technol, 1991; 48: 81 ~ 95
7 Musil J,Kadlec S. Vacuum, 1990; 40(5 ): 435~ 444
8 Hofmann D,Hensel B, Yasuoka M et of . Surf Coat Technol, 1993; 61: 326~ 330
9 Window B, Savvides N. J Vac Sci Technol, 1986 ; A4 (2): 196~ 202
10 Window B,Savvides N. J Vac Sci Technol, 1986;A4 (3): 453~ 456
11 Savvides N,Window B. J Vac Sci Technol, 1986;A4(3): 504~508
12 Spencer A G,Oka K, Howson R p et al. Vacuum, 1988; 38 (8~ 10): 857~859
13 Teer D G. Surf Coat Techno1, 1988; 36: 901
14 Musil J,Kadlec S, Vyskocil J et al. Surf Coat Technol, 1989 ; 39/40: 301
15 Sproul W D, Rudnik P J, Graham M E et al. Surf Coat Technol, 1990; 43/44: 270~278
16 Rohde S L,Hultman L,Wong M S el al. Surf Coat Technol, 1992; 50: 255~ 262
17 Graham M E. Thin Solid Films, 1990; 193/194: 117~ 126
18 Robinson P,Matthews A. Surf Coat Technol, 1990; 43/44: 288~ 298
19 Teer D G. Surf Coat Technol, 1989; 39/40: 565~ 572
20 Monaghan D P,Teer D G, Laing K C et al. Surf Coat Technol, 1993 ; 59: 21 ~25
21 Arnell R D. Surf Coat Technol, 1993; 59: 105~ 109
22 Mfinz W D, Schulze D,Hauzer F J. Surf Coat Technol, 1992; 50: 169~ 178
23 Mfinz W D,Hauzer F J,SChulze D et al. Surf Coat Technol, 1991; 49: 161 ~ 167
基本信息:
DOI：10.13922/j.cnki.cjovst.1996.01.009
中图分类号:TN305
引用信息:
[1]董骐,范毓殿.非平衡磁控溅射及其应用[J].真空科学与技术,1996(01).DOI:10.13922/j.cnki.cjovst.1996.01.009.
基金信息: