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石墨烯作为一种先进的功能碳材料得到了广泛应用，研究通过对高功率脉冲磁控溅射(HiPIMS)技术沉积的C:Ni:Cu体系薄膜的快速热退火，在300 nm SiO2/Si基底上直接制备石墨烯。研究了C2H2流量、薄膜厚度、工作气压、退火温度、退火时间及退火升温速率等参数对石墨烯层数和质量的影响，在上述参数分别为2 sccm、48 nm、0.3 Pa、900℃、10 min、15℃/s时，成功制备了低缺陷密度的少层(I2D/IG≈1.23,ID/IG≈0.45,FWHM≈71 cm-1)石墨烯。实验结果提供了一种较低温度下(700℃)在所需衬底上直接合成石墨烯的方法，对石墨烯制备技术的发展及石墨烯材料的应用具有重要意义。
Abstract：As a high-performance carbon material, graphene has found various applications. In this study,graphene has been directly prepared on 300 nm SiO2/Si substrates by rapid thermal annealing of C:Ni:Cu films deposited by high power impulse magnetron sputtering(HiPIMS). The parameters affecting the number of layers and quality of graphene during preparation have been systematically investigated, including C2H2 flow rate, film thickness, gas pressure, annealing temperature, annealing time, and heating rate. Few-layer high quality(I2D/IG ≈1.23,ID/IG ≈ 0.45,FWHM ≈ 71 cm-1) graphene has been successfully fabricated at the above parameters of 2 sccm,48 nm, 0.3 Pa, 900℃, 10 min, and 15℃/s, respectively. The experimental results provide a method for synthesizing graphene directly on the desired substrate at low temperatures(700℃), which is significant for the development of graphene preparation technology and the application of graphene materials.
[1]Tang H,Menabde S G,Anwar T,et al.Photo-modulated optical and electrical properties of graphene[J].Nanophotonics,2022,11(5):917-940
[2]Wang J,Mu X,Sun M.The thermal,electrical and thermoelectric properties of graphene nanomaterials[J].Nanomaterials,2019,9(2):218-247
[3]Kumar V.Linear and nonlinear opticalproperties of graphene:a review[J].Journal of electronic materials,2021,50(7):3773-3799
[4]Sun Y W,Papageorgiou D G,Humphreys C J,et al.Mechanical properties of graphene[J].Applied physics reviews,2021,8(2):021310
[5]Chen S,Li Z,Gao Y,et al.Preparation of few-layer graphene by annealing Ni film with low carbon content deposited by direct current magnetron sputtering[J].Vacuum,2024,227:113421
[6]Edwards R S,Coleman K S.Graphene film growth on polycrystalline metals[J].Accounts of chemical research,2013,46(1):23-30
[7]Chen X,Zhang L,Chen S.Large area CVD growth of graphene[J].Synthetic metals,2015,210:95-108
[8]Park Y,Kim Y,Myung C W,et al.Two-dimensional excitonic photoluminescence in graphene on a Cu surface[J].ACS nano,2017,11(3):3207-3212
[9]Hu Y G,Ji M H,Peng J P,et al.Anomalous temperature dependence of the magnetoresistance in vertical Ni/graphene/Ni junctions[J].Journal of magnetism and magnetic materials,2019,487:165317
[10]Zhang Y,Zhang L Y,Zhou C W.Review of chemical vapor deposition of graphene and related applications[J].Accounts of chemical research,2013,46(10):2329-2339
[11]Xiong W,Zhou Y S,Hou W J,et al.Solid-state graphene formation via a nickel carbide intermediate phase[J].RSCadvances,2015,5(120):99037-99043
[12]Li Y F,Wu Y,Zhou Y,et al.Diffusion,nucleation,and self-optimization in the forming process of graphene in annealed nickel-carbon alloy[J].The journal of physical chemistry C,2017,121(38):21001-21010
[13]Li H C,Li X W,Wei J,et al.Crystalline transformation from ta-C to graphene induced by a catalytic Ni layer during annealing[J].Diamond and related materials,2020,101:107556
[14]Kwak J,Kwon T Y,Chu J H,et al.In situ observations of gas phase dynamics during graphene growth using solidstate carbon sources[J].Physical chemistry chemical physics,2013,15(25):10446-10452
[15]Li X,Cai W,Colombo L,et al.Evolution of graphene growth on Ni and Cu by carbon isotope labeling[J].Nano letters,2009,9(12):4268-4272
[16]Huang M,Ruoff R S.Growth of single-layer and multilayer graphene on Cu/Ni alloy substrates[J].Accounts of chemical research,2020,53(4):800-811
[17]Reina A,Thiele S,Jia X,et al.Growth of large-area single-and bi-layer graphene by controlled carbon precipitation on polycrystalline Ni surfaces[J].Nano research,2010,2(6):509-516
[18]Liu X,Fu L,Liu N,et al.Segregation growth of graphene on Cu-Ni Alloy for precise Layer control[J].The journal of physical chemistry C,2011,115(24):11976-11982
[19]Wan D Y,Lin T Q,Bi H,et al.Autonomously controlled homogenous growth of wafer-sized high-quality graphene via a smart janus substrate[J].Advanced functional materials,2012,22(5):1033-1039
[20]Liu W,Kraemer S,Sarkar D,et al.Controllable and rapid synthesis of high-quality and large-area bernal stacked bilayer graphene using chemical vapor deposition[J].Chemistry of materials,2013,26(2):907-915
[21]Takesaki Y,Kawahara K,Hibino H,et al.Highly uniform bilayer graphene on epitaxial Cu-Ni(111) alloy[J].Chemistry of materials,2016,28(13):4583-4592
[22]Kouznetsov V,Macák K,Schneider J M.A novel pulsed magnetron sputter technique utilizing very high target power densities[J].Surface&coatings technology,1999,122(2-3):290-293
[23]Li Q,Ying M J,Liu Z W,et al.The low temperature growth of stable p-type ZnO films in HiPIMS[J].Plasma science and technology,2021,23(9):095503
[24]Hsieh P Y,Chen Y H,Matthews David T A,et al.HiP-IMS obtained carbon nano-coatings on copper foil and their thermal conductivity[J].Surface and coatings technology,2022,442:128565
[25]Ogawa Y,Hu B S,Orofeo C M,et al.Domain structure and boundary in single-layer graphene grown on Cu(111)and Cu(100) films[J].The journal of physical chemistry letters,2012,3(2):219-226
[26]Popov D N,Kotlarova T K,Uzunov T D.Oxygen incorporation in Al thin films during deposition by dc magnetron sputtering[J].Vacuum,1988,38(11):1015-1017
[27]Moram M A,Barber Z H,Humphreys C J.The effect of oxygen incorporation in sputtered scandium nitride films[J].Thin solid films,2008,516(23):8569-8572
[28]Kovács G J,Bertóti I,Radnóczi G.X-ray photoelectron spectroscopic study of magnetron sputtered carbon-nickel composite films[J].Thin solid films,2008,516(21):7942-7946
[29]Abrasonis G,Scheinost A C,Zhou S,et al.X-ray spectroscopic and magnetic investigation of C:Ni nanocomposite films grown by ion beam cosputtering[J].Journal of physical chemistry C,2008,112(33):2628-12637
[30]Xiong W,Guo Q,Guo Z,et al.Atomic layer deposition of nickel carbide for supercapacitors and electrocatalytic hydrogen evolution[J].Journal of materials chemistry A,2018,6(10):4297-4304
[31]Bayer B C,Bosworth D A,Michaelis F B,et al.In situ observations of phase transitions in metastable nickel(-carbide)/carbon nanocomposites[J].The journal of physical chemistry C,2016,120(39):22571-22584
[32]Ehrlich A,Kühn M,Richter F,et al.Complex characterisation of vacuum arc-deposited chromium nitride thin films[J].Surface and coatings technology,1995,76-77:280-286
[33]Li Q,Yang L Z,Wang Z D,et al.The superior properties of CrN coatings prepared by high power pulsed reactive magnetron sputtering[J].AIP advances,2020,10(1):015125
[34]Panciera F,Hoummada K,Perrin C,et al.Ni(Pt)-silicide contacts on CMOS devices:Impact of substrate nature and Pt concentration on the phase formation[J].Microelectronic engineering,2014,120(25):34-40
[35]Li X,Cheng B,Asempah I,et al.Effect of different Ni contents on thermal stability of Cu(Ni) alloy film[J].Journal of electronic materials,2020,49(10):5674-5680
[36]Wang L,Guo X,Dong S T,et al.Effect of carbon-doped Cu(Ni) alloy film for barrierless copper interconnect[J].Coatings,2024,14(1):68-78
[37]Cheng B,Chen H M,Asempah I,et al.Self-formed diffusion layer in Cu(Re) alloy film for barrierless copper metallization[J].Coatings,2022,12(5):613-621
[38]Seah C M,Chai S P,Mohamed A R.Mechanisms of graphene growth by chemical vapour deposition on transition metals[J].Carbon,2014,70:1-21
[39]Grigore E,El Mel A A,Granier A,et al.The influence of Ni content on the characteristics of C-Ni thin films[J].Surface&coatings technology,2012,211:188-191
[40]Chen S,Cai W,Piner R D,et al.Synthesis and characterization of large-area graphene and graphite films on commercial Cu-Ni alloy foils[J].Nano letters,2011,11(9):3519-3525
[41]Bleu Y,Bourquard F,Michalon J Y,et al.Transfer-free graphene synthesis by nickel catalyst dewetting using rapid thermal annealing[J].Applied surface science,2021,555:149492
[42]Tan P,Fu L C,Teng J,et al.Effect of texture on wear resistance of tantalum nitride film[J].Tribology international,2019,133:126-135
[43]Cho J H,Gorman J J,Na S R,et al.Growth of monolayer graphene on nanoscale copper-nickel alloy thin films[J].Carbon,2017,115:441-448
[44]Zheng M,Takei K,Hsia B,et al.Metal-catalyzed crystallization of amorphous carbon to graphene[J].Applied physics letters,2010,96(6):063110
基本信息:
DOI：10.13922/j.cnki.cjvst.202501017
中图分类号:TB383.2;TQ127.11
引用信息:
[1]李筝,高远,刘森等.高功率脉冲磁控溅射制备C:Ni:Cu体系薄膜及其热分解制备少层石墨烯[J].真空科学与技术学报,2025,45(05):388-397.DOI:10.13922/j.cnki.cjvst.202501017.
基金信息:
国家自然科学基金项目（12475255）; 北京市自然科学基金项目（2232061）; 北京印刷学院项目（Eb202401; 21090124010）