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永磁体是溅射离子泵重要的组成部件，通过数值模拟对现有溅射离子泵结构中的空间磁场分布进行分析，从而得到溅射离子泵外磁场和内磁场分布特征。在此基础上，提出了降低磁场外溢的双层磁屏蔽结构和提高内部磁场均匀度的NN极同向阵列永磁体模型。双层磁屏蔽可以提供更高效屏蔽作用，气隙比控制在5%时，屏蔽效果可达到最大值的80%以上；内磁场将单一永磁体改为NN极同向阵列模型，可以有效提高磁场均匀度。提出的结构模型对溅射离子泵磁场优化设计提供一定的理论参考。
Abstract：Permanent magnets are essential components of sputter ion pumps. Numerical simulation is used to analyze the spatial magnetic field distribution in the existing structure of sputter ion pumps, thereby obtaining the characteristics of the external and internal magnetic field distribution of the sputter ion pumps. Besides that, a double-layer magnetic shielding structure to reduce magnetic field leakage and an NN-pole co-directional array permanent magnet model to improve the uniformity of the internal magnetic field have been proposed. The doublelayer magnetic shielding can provide more efficient shielding, and when the air gap ratio is controlled at 5%, the shielding effect can reach more than 80% of the maximum value; changing the single permanent magnet to an NNpole co-directional array pattern can effectively improve the uniformity of the magnetic field. The proposed structural models offer a theoretical framework for optimizing the magnetic field design in sputter ion pumps.
[1]Li P C, Zhang F, Zhang Z H, et al. Plasma behavior and distribution characteristics of argon glow discharge in magnetron sputtering source[J]. Chinese Journal of Vacuum Science and Technology,2024,44(6):521-528（李平川,张帆,张正浩,等.磁控溅射源中氩辉光放电的等离子体行为及分布特性[J].真空科学与技术学报，2024,44(6):521-528(in Chinese)）
[2]Jepsen R L. The physics of sputter-ion pumps[C]. Proceedings of the 4th International Vacuum Congress, 1968:317-324
[3]Zenjiro ODA. Sputter-ion pump(I)[J]. Shinku, 1970,13(7):223-231
[4]Semenov A, Anashin V, Krasnov A. Development of sputter ion pump with strong magnetic field for obtaining of ultra-high vacuum[C]. AIP Conference Proceedings,2020, 2299:020010
[5]Laurent J M, Gr?bner O. Distributed sputter-ion pumps for use in low magnetic fields[J]. IEEE Transactions on Nuclear Science,1979,26(3):3997-3999
[6]Yusuke S. Numerical calculation of an ion pump's pumping speed[J]. Vacuum,1995,46(2):105-111
[7]Hseuh H C, Jiang W S, Mapes M. Pumping behavior of ion pump elements at high and misaligned magnetic fields[J]. Journal of Vacuum Science&Technology A,1995,13(3):531-535
[8]Rashid M H. Design of a new sputter ion pump using axisymmetric electric and magnetic field[J]. Indian Journal of Physics,2013,87(3):251-261
[9]Paolini C, Audi M, Denning M. Ion pump design for improved pumping speed at low pressure[J]. Applied Science and Convergence Technology,2016,25(6):108-115
[10]Gu L, Yang J, Zhao H, et al. Simulation analysis of factors affecting penning discharge in high current pulsed electron beam[J]. Chinese Journal of Vacuum Science and Technology,2024,44(2):184-190（古亮,杨捷,赵华,等.强流脉冲电子束中影响潘宁放电因素的模拟分析[J].真空科学与技术学报，2024,44(2):184-190(in Chinese)）
[11]Ren C H, Huang B D, Zhang C, et al. The critical effect of electron acceleration under enhanced electric field near cathode on the formation of runaway electrons and diffuse discharge in atmosphere[J]. Plasma Sources Science and Technology,2023,32(8):085013
[12]Cui Y H, Dou R C, Wang K, et al. Influence of chamber structure on pumping performance of sputter-ion pump:a monte carlo simulation[J]. Chinese Journal of Vacuum Science and Technology,2019,39(2):107-110（崔寓淏,窦仁超,王凯,等.基于蒙特卡洛法溅射离子泵泵腔结构研究[J].真空科学与技术学报，2019,39(2):107-110(in Chinese)）
[13]Yang D, Liu S Y, Zhang H, et al. Research on MPI zero magnetic field based on permanent magnet and coil composite structure[J/OL]. Transactions of China Electrotechnical Society, 2024-04-28（杨丹,刘素羽,张昊,等.基于永磁体和线圈复合结构的MPI零磁场研究[J/OL].电工技术学报, 2024-04-28）
[14]Maccarrone C, Paolini C, Carbonero E, et al. Ion pump shield:U. S. Patent 11, 355, 327[P]. 2022-6-7
[15]Welch K M. Sputter-ion pump having improved cooling and improved magnetic circuitry:U. S. Patent 3, 994,625[P]. 1976-11-30
[16]Paperno E, Peliwal S, Romalis M V, et al. Optimum shell separation for closed axial cylindrical magnetic shields[J].Journal of Applied Physics, 97(10):10Q104
[17]Zhang X, Zhang P C, Yang Q X, et al. Magnetic shielding design and analysis for wireless charging coupler of electric vehicles based on finite element method[J].Transactions of China Electrotechnical Society, 2016,31(1):71-79（张献,章鹏程,杨庆新,等.基于有限元方法的电动汽车无线充电耦合机构的磁屏蔽设计与分析[J].电工技术学报，2016,31(1):71-79(in Chinese)）
[18]Li J T, Fang J C. Magnetic shielding method and experiment study of inertial measurement unit based on high precision fiber-optic gyroscope[J]. Acta Aeronautica et Astronautica Sinica,2011,32(11):2106-2116（李金涛,房建成.高精度光纤IMU的磁屏蔽方法及实验研究[J].航空学报，2011,32(11):2106-2116(in Chinese)）
[19]Guo Y F, Yin S H, Huang S. Study on machining characteristic and its mechanism of magnetorheological polishing with halbach array and other excitation modes[J].Journal of Mechanical Engineering, 2023, 59(15):341-353（郭源帆,尹韶辉,黄帅. Halbach阵列与不同励磁方式的磁流变抛光特性及机理研究[J].机械工程学报，2023,59(15):341-353(in Chinese)）
[20]Xu S J, Xu Y P, Jin B J, et al. Method of improving the evenness of magnetic field[J]. Journal of Applied Sciences,1994,12(002):171-178（许澍均,徐幼鹏,金汴骏,等.提高磁场均匀度的方法[J].应用科学学报，1994,12(002):171-178(in Chinese)）
基本信息:
DOI：10.13922/j.cnki.cjvst.202501001
中图分类号:TB752
引用信息:
[1]王岩,王鹏飞,任晨华,等.溅射离子泵空间磁场的分布优化研究[J].真空科学与技术学报,2025,45(10):827-833.DOI:10.13922/j.cnki.cjvst.202501001.
基金信息:
国家重点研发计划项目（2023YFF0721100）; 山东省重点研发计划项目（2023CXPT093）